Studying chemical vapor deposition processes with theoretical chemistry

Studying chemical vapor deposition processes with theoretical chemistry

Elementary processes in chemical vapor deposition: quantum chemical approach

Chemical vapor deposition (CVD) is one of the key technologies for the epitaxial crystal growth of semiconductors. In order to obtain high-performance devices, atomically controlled thin films are required. Layer by layer growth consists of various processes, i.e ., the thermal decomposition of precursors, the adsorption of growing species, their surface migration, two-dimensional nucleation, t...

Nanotopographical control of surfaces using chemical vapor deposition processes

In recent years much work has been conducted in order to create patterned and structured polymer coatings using vapor deposition techniques - not only via post-deposition treatment, but also directly during the deposition process. Two-dimensional and three-dimensional structures can be achieved via various vapor deposition strategies, for instance, using masks, exploiting surface properties tha...

Multiscale modeling and systemic analysis of chemical vapor deposition processes

Two multiscale computational frameworks are proposed for coupling/linking the co-existing scales in chemical vapor deposition (CVD)processes: From the macro-scale of a CVD reactor (~cm or m) to the transport inside micro-features (~μm) and kinetic Monte Carlo techniques in the nano-scale (~nm). To accelerate the computations parallel processing techniques are used. Moreover, a computational fra...

Spatially controllable chemical vapor deposition

Most conventional chemical vapor deposition (CVD) systems do not have the spatial actuation and sensing capabilities necessary to control deposition uniformity, or to intentionally induce nonuniform deposition patterns for single-wafer combinatorial CVD experiments. In an effort to address this limitation, a novel CVD reactor system has been developed that can explicitly control the spatial pro...